Basic Electricity:

Electrons in motion. Negatively charged particles Move from place of negative charge to one of positive charge. Electrons generally flow through matter. Occurs most easily in metals. Conductors: free flow of electrons. Metals Insulators: very little free flow of electrons. Non-metals. Semi-conductors: electrons can be made to flow. RESISTANCE: opposition to current flow. OHM: unit measuring resistance to flow. Lower the resistance, the easier the flow. Electrons measured in groups. COULOMB: 6.24 x 10 to the 18th electrons. Electrons are measured in motion. AMPERE or AMP = One coulomb per second. ELECTROMOTIVE FORCE (EMF): Flow of electrons from high concentration or potential to low. Polential is measured in VOLTS. One VOLT = EMF required to push one COULOMB per SECOND through one OHM. Electricity can perform work when in motion. This work is expressed in Watts. WATTS: a measure of Power, i.e. Work performed.

FORMULAE:

OHMS LAW. Intensity = EMF/ Resistance
I = E/R
Can be expessed as:
I=E/R E = IR R = E/I
POWER formula: Work = Intensity x Force PIE Law: P = IE Power = Intensity x EMF or in the units of measure: West Virginia Law: Watts = Volts x Amps By combining these, you can derive the characteristics of electrical devices in a circuit. Examples: 500 w. lamp at 100 v. A=W/V = 500/100 = 5 amps R=E/I = 100/5 = 20 ohms 1000 w. lamp at 100 v A=W/V = 1000/100 = 10 amps R = 100/10 = 10 ohms

CIRCUITS:

Basic principles: -The higher the source potential, the higher the flow. -Breaking circuit stops flow. -The larger the conductor, the easier the flow. -The lower the resistance of load, the faster the flow. -To much flow breaks the load. -When source is drained, flow stops. Series and parellel circuits Series: flow through each element sequentially. Parellel: flow through multiple elements simultaneously. Resistance in Circuits: Series Circuits: total resistance directly proportional Parellel Circuits: total resistance inversly proportional

Maintained by: Mick Alderson (alderson@uwosh.edu)       Last modified: 8/12/2000
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